Low Differential Pressure Mass Flow Controller

Low differential pressure mass flow controller with a minimum operating differential pressure of 800 Pa.

MC-3000S Series

Pressure loss is reduced with a unique ambient temperature compensated flow rate sensor with low pressure loss specifications and an accuracy of ±1%F.S.

Proprietary piezo actuator valve provides precise flow control and stability with low differential pressure.

Example of Use

Flow control of low vapor pressure gas at low temperature

The MC-3000S is a low differential pressure mass flow controller that uses a unique low pressure loss structure to control the flow rate of liquid raw materials such as H2O even at normal temperatures, as long as the downstream is in a vacuum state. It is recommended for ITO sputtering methods that require a small amount of water vapor to be flown into the vacuum chamber. In addition, it is possible to control the flow rate of solid materials at normal temperature with low vapor pressure, such as XeF2.

Flow control of gases supplied from reduced pressure tank containers (SDS container)

Ion implantation tools use special material gases such as AsH3 and PH3, which are often supplied from Safe Delivery Source (SDS) containers for safety and stability reasons. The inner pressure of the SDS containers is lower than the atmospheric pressure, and thus a low pressure MFC is required to control the flow rate. MC-3000S’ unique low pressure drop structure allows flow control at a minimum differential pressure of 800Pa (6Torr).

Specification Table