MC-3000L-TC Series<\/h2>\n\n\n\n
Gas control at high temperature is possible by separating the wetted part and the circuit board part which is sensitive to heat.<\/p>\n\n\n\n
SUS-316L is used for the block and Au is used for the sealing material, making it compatible with corrosive gases.<\/p>\n\n\n\n
Low differential pressure specification that prevents condensation of liquified gas and MFC special heater block to heat up the wetted part are also available as options.<\/p>\n<\/div>\n\n\n\n
![\"High](\"https:\/\/lintec-mfc.co.jp\/en\/wp-content\/uploads\/2023\/07\/MC-3000L-TC.jpg\")
Feature<\/span><\/h3>\n\n\n\n\n- Operating temperature Max 120\u00b0C<\/li>\n\n\n\n
- Metal seal<\/li>\n\n\n\n
- Clean (zero particle structure)<\/li>\n\n\n\n
- RS-485 communication<\/li>\n<\/ul>\n<\/div>\n\n\n\n\n
Option<\/span><\/h3>\n\n\n\n\n- Liquefied Gas Compatible<\/li>\n\n\n\n
- Heater block<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n
Example of Use<\/h3>\n\n\n\nLiquefied gas, sublimation gas flow control<\/h4>\n\n\n\n
The precursor gases for CVD and ALD are not always at the normal temperature and pressure. Liquids and solid materials generate less gas at normal temperatures, making it difficult to control the flow rate with MFCs that use differential pressure<\/span><\/a> <\/a>to flow gas. Therefore, the operating pressure of the MFC is secured by heating the raw material tank and increasing the vapor pressure to generate differential pressure. MC-3000L-TC, which is capable of flow control at high temperatures and low differential pressure, is ideal for controlling the flow rate of liquefied gas and sublimated gas.<\/p>\n\n\n\nSpecification Table<\/h3>\n\n\n\nModel<\/th> MC-3102L-TC<\/th> MC-3202L-TC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 25SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 150 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> L\uff1a80 \uff5e 100\u2103
H\uff1a100 \uff5e 120\u2103<\/td><\/tr> Seal materials<\/td> Au<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
Option<\/span><\/h3>\n\n\n\n\n- Liquefied Gas Compatible<\/li>\n\n\n\n
- Heater block<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n
Example of Use<\/h3>\n\n\n\nLiquefied gas, sublimation gas flow control<\/h4>\n\n\n\n
The precursor gases for CVD and ALD are not always at the normal temperature and pressure. Liquids and solid materials generate less gas at normal temperatures, making it difficult to control the flow rate with MFCs that use differential pressure<\/span><\/a> <\/a>to flow gas. Therefore, the operating pressure of the MFC is secured by heating the raw material tank and increasing the vapor pressure to generate differential pressure. MC-3000L-TC, which is capable of flow control at high temperatures and low differential pressure, is ideal for controlling the flow rate of liquefied gas and sublimated gas.<\/p>\n\n\n\nSpecification Table<\/h3>\n\n\n\nModel<\/th> MC-3102L-TC<\/th> MC-3202L-TC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 25SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 150 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> L\uff1a80 \uff5e 100\u2103
H\uff1a100 \uff5e 120\u2103<\/td><\/tr> Seal materials<\/td> Au<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
Example of Use<\/h3>\n\n\n\nLiquefied gas, sublimation gas flow control<\/h4>\n\n\n\n
The precursor gases for CVD and ALD are not always at the normal temperature and pressure. Liquids and solid materials generate less gas at normal temperatures, making it difficult to control the flow rate with MFCs that use differential pressure<\/span><\/a> <\/a>to flow gas. Therefore, the operating pressure of the MFC is secured by heating the raw material tank and increasing the vapor pressure to generate differential pressure. MC-3000L-TC, which is capable of flow control at high temperatures and low differential pressure, is ideal for controlling the flow rate of liquefied gas and sublimated gas.<\/p>\n\n\n\nSpecification Table<\/h3>\n\n\n\n
Model<\/th> MC-3102L-TC<\/th> MC-3202L-TC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 25SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 150 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> L\uff1a80 \uff5e 100\u2103
H\uff1a100 \uff5e 120\u2103<\/td><\/tr>Seal materials<\/td> Au<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n