MC-10 Series<\/h2>\n\n\n\n
A low-cost mass flow controller ideal for controlling the flow rate of inert gases such as Ar, N2, etc. and controlling the flow rate of Air. Limited specifications enable quick delivery time.<\/p>\n\n\n\n
RS-485 digital interface and variable range function are available as options<\/p>\n<\/div>\n\n\n\n
![\"\"](\"https:\/\/lintec-mfc.co.jp\/en\/wp-content\/uploads\/2023\/07\/MC-10-1.jpg\")
Feature<\/span><\/h3>\n\n\n\n\n- Low price<\/li>\n<\/ul>\n<\/div>\n\n\n\n\n
Option<\/span><\/h3>\n\n\n\n\n- Variable function<\/li>\n\n\n\n
- RS-485 communication<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n
Example of Use<\/h3>\n\n\n\nPVD<\/h4>\n\n\n\n
In PVD film deposition processes such as sputtering, Ar is generally used as an inert gas, a stable gas that is less likely to cause chemical reactions. If you need to control the flow rate of an inert gas such as Ar, we recommend the low-cost mass flow controller MC-10RC.<\/p>\n\n\n\n
Inert gas analysis and experimental equipment<\/h4>\n\n\n\n
We recommend the low-cost MC-10RC for applications that don\u2019t require corrosive gases. Furthermore, with the VR function option, it is possible to change the gas type and flow range in-line. This product is ideal for simple experiments and analytical equipment.<\/p>\n\n\n\n
Specification Table<\/h3>\n\n\n\nModel<\/th> MC-10RC<\/th> MC-11RC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 50SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 200 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> 15 \uff5e 35\u2103<\/td><\/tr> Seal materials<\/td> Viton\u00ae<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
Option<\/span><\/h3>\n\n\n\n\n- Variable function<\/li>\n\n\n\n
- RS-485 communication<\/li>\n<\/ul>\n<\/div>\n<\/div>\n\n\n\n
Example of Use<\/h3>\n\n\n\nPVD<\/h4>\n\n\n\n
In PVD film deposition processes such as sputtering, Ar is generally used as an inert gas, a stable gas that is less likely to cause chemical reactions. If you need to control the flow rate of an inert gas such as Ar, we recommend the low-cost mass flow controller MC-10RC.<\/p>\n\n\n\n
Inert gas analysis and experimental equipment<\/h4>\n\n\n\n
We recommend the low-cost MC-10RC for applications that don\u2019t require corrosive gases. Furthermore, with the VR function option, it is possible to change the gas type and flow range in-line. This product is ideal for simple experiments and analytical equipment.<\/p>\n\n\n\n
Specification Table<\/h3>\n\n\n\nModel<\/th> MC-10RC<\/th> MC-11RC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 50SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 200 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> 15 \uff5e 35\u2103<\/td><\/tr> Seal materials<\/td> Viton\u00ae<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
Example of Use<\/h3>\n\n\n\nPVD<\/h4>\n\n\n\n
In PVD film deposition processes such as sputtering, Ar is generally used as an inert gas, a stable gas that is less likely to cause chemical reactions. If you need to control the flow rate of an inert gas such as Ar, we recommend the low-cost mass flow controller MC-10RC.<\/p>\n\n\n\n
Inert gas analysis and experimental equipment<\/h4>\n\n\n\n
We recommend the low-cost MC-10RC for applications that don\u2019t require corrosive gases. Furthermore, with the VR function option, it is possible to change the gas type and flow range in-line. This product is ideal for simple experiments and analytical equipment.<\/p>\n\n\n\n
Specification Table<\/h3>\n\n\n\nModel<\/th> MC-10RC<\/th> MC-11RC<\/th><\/tr><\/thead> Flow rate in Nitrogen(Full scale)<\/td> 10 \uff5e 5,000SCCM<\/td> \uff5e 50SLM<\/td><\/tr> Flow rate control range<\/td> 2 \uff5e 100% F.S.<\/td><\/tr> Accuracy<\/td> \u00b11.0% F.S.<\/td><\/tr> Operating differential pressure<\/td> 50 \uff5e 300kPa<\/td> 200 \uff5e 300kPa<\/td><\/tr> Temperature<\/td> 15 \uff5e 35\u2103<\/td><\/tr> Seal materials<\/td> Viton\u00ae<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
| Model<\/th> | MC-10RC<\/th> | MC-11RC<\/th><\/tr><\/thead> |
|---|---|---|
| Flow rate in Nitrogen(Full scale)<\/td> | 10 \uff5e 5,000SCCM<\/td> | \uff5e 50SLM<\/td><\/tr> |
| Flow rate control range<\/td> | 2 \uff5e 100% F.S.<\/td><\/tr> | |
| Accuracy<\/td> | \u00b11.0% F.S.<\/td><\/tr> | |
| Operating differential pressure<\/td> | 50 \uff5e 300kPa<\/td> | 200 \uff5e 300kPa<\/td><\/tr> |
| Temperature<\/td> | 15 \uff5e 35\u2103<\/td><\/tr> | |
| Seal materials<\/td> | Viton\u00ae<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n |